Method for making microstructures

A method of making microstructures, comprising:

• providing a first substrate having a surface, setting a photoresist layer on the surface of the first substrate;
• covering a surface of the photoresist layer with a photolithography mask plate, wherein the photolithography mask plate comprises a second substrate and a carbon nanotube composite layer located on a surface of the second substrate, the carbon nanotube composite layer comprises a carbon nanotube layer and a cover layer, the carbon nanotube layer comprises a plurality of carbon nanotubes and defines a plurality of holes between adjacent carbon nanotubes, the photolithography mask plate comprises a light transmitting region and a light absorption region, the light transmitting region corresponds to the plurality of holes, and the light absorption region corresponds to the plurality of carbon nanotubes;
• exposing the photoresist layer to form an exposed photoresist layer by irradiating the photoresist layer through the photolithography mask plate with ultraviolet light, wherein a surface of the photoresist layer corresponding to the light transmitting region is exposed to the ultraviolet light, and a surface of the photoresist layer corresponding to the light absorption region is not exposed to the ultraviolet light;
• and
• developing the exposed photoresist layer to obtain a patterned photoresist microstructures, wherein a pattern of the patterned photoresist microstructures is consistent with a pattern of the carbon nanotube layer.