Reflective mask, reflective mask blank, and manufacturing method therefor

A reflective mask blank comprising:

• a substrate;
• a multi-layer reflective layer formed on a front surface of the substrate;
• a protective layer formed on the multi-layer reflective layer;
• and
• an absorbing layer formed on the protective layer, wherein:
• the absorbing layer is provided with a circuit pattern region having an outer portion which at least partially includes a light shielding frame having low reflectivity to EUV light and out-of-band light, with the absorbing layer, the protective layer and the multi-layer reflective layer being removed from the outer portion;
• and
• the substrate within the light shielding frame is provided thereon with an antireflective layer containing at least one of Si, Mo, Ta, Cr, Ru, Al, Ti, Zn, Su, Hf, W, Zr, and Cu, or an oxide, nitride, or oxynitride thereof, and wherein the antireflective layer has an electrical conductivity of 1×104/mΩ or greater.