Method of manufacturing cu core ball
AssigneeSenju Metal Industry Co., Ltd.
InventorsHiroyoshi Kawasaki, Takahiro Roppongi, Daisuke Soma, Isamu Sato
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AssigneeSenju Metal Industry Co., Ltd.
InventorsHiroyoshi Kawasaki, Takahiro Roppongi, Daisuke Soma, Isamu Sato
Estimating the term…
A Cu core ball and a method of manufacturing such a Cu core ball. Purity of the Cu internal ball is at least 99.9% and not greater than 99.995%. A total contained amount of Pb and/or Bi in impurity contained in the Cu ball is equal to or larger than 1 ppm. Its sphericity is at least 0.95. A solder plating film coated on the Cu ball is of Sn solder or a lead free solder alloy whose primary component is Sn. In the solder plating film, a contained amount of U is not more than 5 ppb and that of Th is not more than 5 ppb. A total alpha dose of the Cu ball and the solder plating film is not more than 0./0200 cph/cm2. An arithmetic average roughness of the Cu core ball is equal to or less than 0.3 μm.
A method of manufacturing a Cu core ball, comprising:
Dependencies are inferred from the claim text.