Method of manufacturing patterned substrate

A method of manufacturing a patterned substrate, comprising:

• forming a polymer film on a surface of an oxygen plasma-treated substrate, wherein the polymer film comprises a block copolymer that includes a first block and a second block, and the block copolymer forms a self-assembly structure, where an interface between a domain formed by the first block and a domain formed by the second block is vertical to a surface of the substrate, and wherein the first block includes a ring structure substituted with a side chain having 8 or more chain-forming atoms, and the ring structure is linked to a main chain of the first block as a side chain, wherein the ring structure is directly linked or is linked to the main chain via a linker and the linker is an oxygen atom, a sulfur atom, —S(═O)2—, a carbonyl group, —C(═O)—X1— or —X1—C(═O)—, where the X1 is an oxygen atom or a sulfur atom.