Ozone abatement system for semiconductor manufacturing system
AssigneeInternational Business Machines Corporation
InventorEdward L. Pepe
Life of this patent
Estimating the term…
Abstract
An apparatus and method for abating ozone and reducing sulfuric acid from an exhaust stream. In a semiconductor manufacturing plant the processing of wafers involves the cleaning and etching of wafers, the resultant processing may produce gasses which must be abated. The apparatus and method utilizes UV light in high doses to convert ozone (O3) to oxygen (O2). By ensuring laminar flow through the UV light chambers, the efficiency of the system is sufficient to allow for the remaining impurities in the exhaust air to be removed through the use of an RTO.
Claims17
An apparatus comprising:
- a first ozone abatement chamber comprising inner surfaces coated with a reflective material and a first series of laminar flow plates to ensure laminar flow through the first ozone abatement chamber;
- a second ozone abatement chamber connected in series with the first ozone abatement chamber, the second ozone abatement chamber comprising inner surfaces coated with the reflective material and a second series of laminar flow plates to ensure laminar flow through the second ozone abatement chamber;
- an inlet connected to the first ozone abatement chamber and adapted to accept exhaust air from an exhaust duct;
- a third series of laminar flow plates positioned between the first ozone abatement chamber and the second ozone abatement chamber to maintain laminar flow of the exhaust air between the first ozone abatement chamber and the second ozone abatement chamber;
- a fourth series of laminar flow plates positioned between the inlet and the first ozone abatement chamber to further ensure laminar flow of the exhaust air as it enters the first ozone abatement chamber;
- and
- an air port connected to the exhaust duct for adding bleed air to dilute the exhaust air,
- wherein at least the first series of laminar flow plates and the second series of laminar flow plates are coated with the reflective material,
- wherein the first, the second, the third and the fourth series of laminar flow plates are all positioned perpendicular to a flow direction of the exhaust air.
An apparatus comprising:
- a first ozone abatement chamber comprising a first central chamber through which exhaust air passes and one or more UV lamps housed in one or more doors, inner surfaces of both the first central chamber and the one or more doors are coated with a reflective material, the one or more doors are situated exterior to the first central chamber and outside a flow path of the exhaust air through the first central chamber, the first central chamber comprising a first series of laminar flow plates to ensure laminar flow through the first central chamber;
- a second ozone abatement chamber comprising a second central chamber through which the exhaust air passes and one or more UV lamps housed in one or more doors, inner surfaces of both the second central chamber and the one or more doors are coated with the reflective material, the one or more doors are situated exterior to the second central chamber and outside the flow path of the exhaust air through the second central chamber, the second central chamber comprising a second series of laminar flow plates to ensure laminar flow through the second central chamber, wherein at least the first series of laminar flow plates and the second series of laminar flow plates are coated with the reflective material;
- an inlet connected to the first ozone abatement chamber and adapted to accept the exhaust air from an exhaust duct;
- a third series of laminar flow plates positioned between the first ozone abatement chamber and the second ozone abatement chamber to maintain laminar flow of the exhaust air between the first ozone abatement chamber and the second ozone abatement chamber;
- and
- a fourth series of laminar flow plates positioned between the inlet and the first ozone abatement chamber to further ensure laminar flow of the exhaust air as it enters the first ozone abatement chamber;
- and
- an air port connected to the exhaust duct for adding bleed air to dilute the exhaust air,
- wherein the first series of laminar flow plates, the second series of laminar flow plates, the third series of laminar flow plates and the fourth series of laminar flow plates are all positioned perpendicular to a flow direction of the exhaust air.
An apparatus comprising:
- an ozone abatement chamber comprising a central chamber through which exhaust air passes and one or more UV lamps housed in one or more doors, inner surfaces of both the central chamber and the one or more doors are coated with a reflective material, the one or more doors are situated exterior to the central chamber and outside the flow of the exhaust air through the central chamber, the central chamber comprising a first series of laminar flow plates to ensure laminar flow through the central chamber, wherein at least the first series of laminar flow plates are coated with the reflective material;
- an inlet connected to the ozone abatement chamber and adapted to accept the exhaust air from an exhaust duct;
- a second series of laminar flow plates positioned between the inlet and the ozone abatement chamber to further ensure laminar flow of the exhaust air as it enters the ozone abatement chamber, wherein the first series of laminar flow plates and the second series of laminar flow plates are positioned perpendicular to a flow direction of the exhaust air;
- and
- a regenerative thermal oxidizer connected in series with the ozone abatement chamber such that the exhaust air exiting the ozone abatement chamber directly enters the regenerative thermal oxidizer;
- and
- an air port connected to the exhaust duct for adding bleed air to dilute the exhaust air.
Dependencies are inferred from the claim text.