Method for producing single crystal
AssigneeSumco Corporation
InventorsYasuhito Narushima, Toshimichi Kubota, Masayuki Uto
Life of this patent
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Abstract
A manufacturing method of a monocrystal includes: a shoulder-formation step to form a shoulder of the monocrystal; and a straight-body-formation step to form a straight body of the monocrystal, in which, in the shoulder-formation step, providing that a distance from a lowermost portion inside the crucible to a top surface of the dopant-added melt is defined as H (mm) and a radius of the top surface of the dopant-added melt is defined as R (mm), the shoulder starts to be formed in a condition that a relationship of 0.4<H/R<0.78 is satisfied.
Claims5
A manufacturing method of a monocrystal having a shoulder-formation step to form a shoulder of the monocrystal, and a straight-body-formation step to form a straight body of the monocrystal in accordance with Czochralski process, using a monocrystal pull-up apparatus provided with
- a chamber,
- a crucible disposed in the chamber and configured to receive a dopant-added melt in which a dopant is added to a silicon melt, and
- a pull-up unit configured to pull up a seed crystal after the seed crystal is brought into contact with the dopant-added melt,
- the method comprising:
- charging the dopant-added melt at an amount capable of manufacturing a plurality of monocrystals at one time in the crucible;
- and
- manufacturing the plurality of the monocrystals one by one without adding a silicon material and the dopant to the crucible, wherein
- provided that a distance from a lowermost portion inside the crucible to a top surface of the dopant-added melt is defined as H (mm) and a radius of the top surface of the dopant-added melt is defined as R (mm), the shoulder of each of the plurality of the monocrystals starts to be formed in a condition that a formula (1) is satisfied,
- 0. 4<H/R<0.78 (1).
Dependencies are inferred from the claim text.