Device and method for exhaust gas treatment on CVD reactor
AssigneeAixtron SE
InventorsPatrick Franken, Markus Deufel
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AssigneeAixtron SE
InventorsPatrick Franken, Markus Deufel
Estimating the term…
A first and second process gas is fed into a device during a first and second process step, respectively. The device has an exhaust gas line through which a first and second exhaust gas is conveyed out of the device in the first and second process step, respectively. A first and second exhaust gas device is connected by means of a valve arrangement optionally to the exhaust gas line in a fluidly communicable and separable manner, with a first and second treatment member for treating an exhaust gas produced in the first and second process step, respectively. A gas feed device is arranged between the valve arrangement and the respective treatment members. A control device is provided whose control variable is the pressure difference between the total pressure in the respective exhaust gas devices and is configured to minimize the pressure difference during switching of the valve arrangement.
A method, comprising:
A method for operating a system, the system comprising (i) a reactor with an exhaust gas line, (ii) a first exhaust gas device with a first treatment member, (iii) a first check valve for controlling whether an exhaust gas flows from the exhaust gas line into the first exhaust gas device, (iv) a second exhaust gas device with a second treatment member, (v) a second check valve for controlling whether the exhaust gas flows from the exhaust gas line into the second exhaust gas device, (vi) a first gas feed device configured to feed a first equalizing gas into a gas conduit disposed between the first exhaust gas device and the first check valve, and (vii) a second gas feed device configured to feed a second equalizing gas into a gas conduit disposed between the second exhaust gas device and the second check valve, the method comprising:
Dependencies are inferred from the claim text.