Bismuth-vanadate-laminate manufacturing method and bismuth-vanadate laminate
AssigneesTokyo University of Science Foundation, Mitsui Chemicals, Inc., Japan Technological Research Association of Artificial Photosynthetic Chemical Process
InventorsAkihiko Kudo, Qingxin Jia, Akihide Iwase
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Abstract
A new BiVO4-laminate manufacturing method and BiVO4 laminate are provided. A bismuth-vanadate laminate is manufactured as follows: a substrate that can be heated by microwaves is disposed inside a precursor solution containing a vanadium salt and a bismuth salt, microwave-activated chemical bath deposition (MW-CBD) is used to form a bismuth-vanadate layer on the substrate, and a firing process is performed as necessary. A bismuth-vanadate laminate manufactured in this way is suitable for use as a photocatalyst or photoelectrode.
Claims7
A manufacturing method for forming two bismuth-vanadate layers on a substrate, the method comprising:
- arranging the substrate in a precursor solution containing a vanadium salt and a bismuth salt,
- heating the substrate arranged in the precursor solution by irradiating with microwave radiation thereby forming a first bismuth-vanadate layer on the substrate, and
- forming a second bismuth-vanadate layer on the first bismuth-vanadate layer by coating and sintering the precursor solution on the first bismuth-vanadate layer,
- wherein ratios of a zircon-structure tetragonal phase and a scheelite-structure monoclinic phase in a crystal phase of the first bismuth-vanadate layer are controlled by controlling at least one of (a) a sintering temperature and (b) a sintering time in the sintering.
Dependencies are inferred from the claim text.