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US 10,319,934 B2Granted
Transparent supported electrode for OLED
AssigneeSaint-Gobain Glass France
InventorsYoungseong Lee, Jinwoo Han
Life of this patent
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Abstract
A supported transparent electrode for an OLED, includes, in succession: (i) a transparent substrate made of mineral glass; (ii) a scattering layer formed from a high-index enamel containing at least 30% by weight Bi2O3; (iii) a barrier layer of at least one dielectric metal oxide chosen from the group consisting of Al2O3, TiO2, ZrO2 and HfO2, deposited by ALD; and (iv) a layer of a transparent conductive oxide (TCO).
Claims13
Supported transparent electrode for an OLED, comprising, in succession:
- (i) a transparent substrate made of mineral glass;
- (ii) a scattering layer formed from a high-index enamel containing at least 30% by weight Bi2O3;
- (iii) a barrier layer of at least one dielectric metal oxide chosen from the group consisting of Al2O3, TiO2, ZrO2 and HfO2, deposited by ALD;
- and
- (iv) a layer of a transparent conductive oxide (TCO),
- wherein the barrier layer deposited by ALD comprises a plurality of Al2O3 layers in alternation with layers of oxides of higher indices (n>2) chosen from TiO2, ZrO2, and HfO2.
3 more elements
Process for manufacturing a supported transparent electrode for an OLED, comprising the following successive steps:
- (a) providing a transparent substrate made of mineral glass bearing, on one of its faces, a scattering layer formed from a high-index enamel containing at least 30% by weight Bi2O3;
- (b) forming, by atomic layer deposition (ALD), a dielectric metal oxide barrier layer that comprises a plurality of Al2O3 layers in alternation with layers of oxides of higher indices (n>2) chosen from TiO2, ZrO2, and HfO2 on the high-index enamel layer, said dielectric metal oxide barrier layer making direct contact with the high-index enamel layer;
- and
- (c) forming a layer of a transparent conductive oxide (TCO) on the dielectric metal oxide barrier layer.
1 more element
Dependencies are inferred from the claim text.