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US 10,319,771 B2Granted
Image sensors and methods of forming the same
AssigneeSamsung Electronics Co., Ltd.
InventorYun Ki Lee
Life of this patent
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Abstract
An image sensor includes a substrate including a light-receiving region and a light-shielding region, a device isolation pattern in the substrate of the light-receiving region to define active pixels, and a device isolation region in the substrate of the light-shielding region to define reference pixels. An isolation technique of the device isolation pattern is different from that of the device isolation region.
Claims12
An image sensor comprising:
- a substrate having a first surface and a second surface opposite to the first surface;
- a plurality of photoelectric conversion parts between the first and second surfaces;
- a plurality of interconnection structures on the first surface;
- a light shielding pattern on the second surface of the substrate;
- a first trench recessed from the second surface of the substrate overlapping the light shielding pattern;
- a second trench recessed from the second surface of the substrate and not overlapping the light shielding pattern;
- a first device isolation pattern in the first trench;
- and
- a second device isolation pattern in the second trench,
- wherein a length of the second device isolation pattern is different from a length of the first device isolation pattern.
7 more elements
An image sensor comprising:
- a substrate having a first surface and a second surface opposite to the first surface;
- a plurality of photoelectric conversion parts between the first and second surfaces;
- a plurality of interconnection structures on the first surface;
- a light shielding pattern on the second surface of the substrate;
- a first trench recessed from the second surface of the substrate overlapping the light shielding pattern;
- a second trench recessed from the second surface of the substrate and not overlapping the light shielding pattern;
- a first device isolation pattern in the first trench;
- and
- a second device isolation pattern in the second trench,
- wherein the light shielding pattern overlaps at least one of the photoelectric conversion parts in a plan view, and
- wherein a bottom surface of the light shielding pattern is at a same or higher level than the second surface of the substrate.
8 more elements
Dependencies are inferred from the claim text.