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US 10,319,605 B2Granted
Semiconductor treatment composition and treatment method
AssigneeJsr Corporation
InventorsYasutaka Kamei, Takahiro Hayama, Naoki Nishiguchi, Satoshi Kamo, Tomotaka Shinoda
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Abstract
A semiconductor treatment composition includes particles having a particle size of 0.1 to 0.3 micrometers in a number of 3×101 to 1.5×103 per mL.
Claims20
A semiconductor treatment composition comprising:
- particles having a particle size of 0.1 to 0.3 micrometers in a number of 3×101 to 1.5×103 per mL,
- wherein the particles include at least one particles selected from a group consisting of metal particles and metal oxide particles.
A semiconductor treatment composition comprising:
- particles having a particle size of 0.1 to 0.3 micrometers in a number of 3×101 to 1.5×103 per mL,
- wherein the particles include silica particles.
Dependencies are inferred from the claim text.