Plasma processing apparatus for performing plasma process for target object
AssigneeTokyo Electron Limited
InventorsIppei Shimizu, Naoki Mihara, Shunsuke Ogata
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AssigneeTokyo Electron Limited
InventorsIppei Shimizu, Naoki Mihara, Shunsuke Ogata
Estimating the term…
A plasma processing apparatus includes a process chamber including a sidewall, a mounting table disposed in the process chamber, a shield member which is disposed along the inner surface of the sidewall to surround the mounting table and has an opening facing the transfer port, and a shutter configured to open/close the opening, the shutter being movable up and down. The shutter has a first portion adapted to face the opening, and a second portion adapted to face the shield member at a lower side of the shield member. The shield member has a lower portion including a contact surface facing the second portion. A contactor adapted to contact the contact surface is disposed at the second portion. The first portion of the shutter closes the opening through a gap between the first portion and the shield member. The contact surface and the contactor are formed of HASTELLOY®.
A plasma processing apparatus for performing a plasma process for a target object, comprising:
Dependencies are inferred from the claim text.