Imaging device and method of producing the same

An imaging device comprising:

• a first region where a plurality of pixel circuits each constituting a light receiving pixel is arranged;
• a second region where a peripheral circuit is arranged;
• and
• a third region positioned between the first region and the second region,
• wherein a semiconductor layer, a first wiring layer disposed over the semiconductor layer, and a second wiring layer disposed farther from the semiconductor layer than the first wiring layer are arranged in the first region, the second region, and the third region,
• wherein the first region includes a first section having a square outline with a width of four sides being from 10 μm to 100 μm, and at least one of the plurality of pixel circuits is positioned in the first section,
• wherein the third region includes a second section having an outline congruent with the square outline of the first section, and at least the one of the plurality of pixel circuits and the peripheral circuit in the second region is connected via a wiring included in at least one of the first wiring layer and the second wiring layer in the second section,
• wherein an occupancy rate of the one of the first wiring layer and the second wiring layer in the second section to an area of the second section is from 0.5 to 1.5 times an occupancy rate of the one of the first wiring layer and the second wiring layer in the first section to an area of the first section, and
• wherein a number of contacts connected to the semiconductor layer in the second section is larger than a number of contacts connected to the semiconductor layer in the first section.