Array substrate and manufacturing method of array substrate for reducing electric field interference

An array substrate, comprising:

• a base substrate;
• a thin-film transistor (TFT) on the base substrate, comprising a source and a drain;
• a data line electrically connected with the source;
• a pixel electrode electrically connected with the drain;
• a transparent conductive layer between the data line and the pixel electrode;
• and
• a color filter layer and a flat protective layer between the transparent conductive layer and the pixel electrode, wherein the color filter layer is located on a side of the transparent conductive layer far away from the data line, and the flat protective layer is located on a side of the color filter layer far away from the transparent conductive layer;
• wherein the data line and the pixel electrode are set on different layers, and the data line, the transparent conductive layer, and the pixel electrode are laminated and insulating to each other.

A method of manufacturing an array substrate, comprising steps of:

• providing a base substrate;
• forming a TFT on the base substrate, comprising a source and a drain;
• forming a data line electrically connected with the source;
• forming a transparent conductive layer between the data line and the pixel electrode;
• and
• forming a pixel electrode electrically connected with the drain,
• wherein the data line and the pixel electrode are set on different layers, and the data line, the transparent conductive layer, and the pixel electrode are laminated and insulating to each other;
• after forming the transparent conductive layer and before forming the pixel electrode, further comprising forming a color filter layer and a flat protective layer covering the color filter layer in order, wherein the color filter layer is located on a side of the transparent conductive layer far away from the data line, and the flat protective layer is located on a side of the color filter layer far away from the transparent conductive layer.