Manufacturing method of semiconductor package
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChao-Wen Shih, Kai-Chiang Wu, Ching-Feng Yang, Ming-Kai Liu, Shih-Wei Liang, Yen-Ping Wang
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChao-Wen Shih, Kai-Chiang Wu, Ching-Feng Yang, Ming-Kai Liu, Shih-Wei Liang, Yen-Ping Wang
Estimating the term…
The present disclosure provides a semiconductor package, which includes a substrate, a passivation layer, a post-passivation interconnect (PPI) having a top surface; and a conductive structure. The top surface of the PPI includes a first region receiving the conductive structure, and a second region surrounding the first region. The second region includes metal derivative transformed from materials made of the first region. The present disclosure provide a method of manufacturing a semiconductor package, including forming a first flux layer covering a portion of a top surface of a PPI; transforming a portion of the top surface of the PPI uncovered by the first flux layer into a metal derivative layer; removing the first flux layer; forming a second flux layer on the first region of the PPI; dropping a solder ball on the flux layer; and forming electrical connection between the solder ball and the PPI.
A method of manufacturing a semiconductor package, comprising:
A method of manufacturing a semiconductor package, comprising:
A method of manufacturing a semiconductor package, comprising:
Dependencies are inferred from the claim text.