Systems and methods for aligning measurement device in substrate processing systems

A substrate support in a substrate processing system, the substrate support comprising:

• an inner portion arranged to support a substrate;
• an edge ring surrounding the inner portion;
• and
• a controller configured to
• selectively cause the edge ring to engage the substrate and tilt the substrate by controlling at least one actuator to at least one of (i) raise and lower the edge ring and (ii) raise and lower the inner portion of the substrate support,
• receive a measurement signal, wherein the measurement signal is indicative of a monitored signal reflected from a surface of the substrate as the substrate is tilted, and
• determine an alignment of a measurement device in the substrate processing system based on the measurement signal indicative of the monitored signal reflected from the surface of the substrate when the substrate is tilted.