Line charge volume with integrated pressure measurement

A line charge volume for use in delivery of gas to a reactor used for processing semiconductor wafers, comprising,

• a chamber that extends between a first end and a second end, the first end includes an inlet port and an outlet port;
• and
• a pressure sensor integrated with the chamber at the second end, the pressure sensor having a measurement side for measuring a deflection of a diaphragm, the diaphragm being directly exposed to an interior of the chamber so that pressure produced by a gas that is flown into the chamber via the inlet port produces a force upon the diaphragm, the gas being held in the chamber with an outlet valve, the measurement side including electronics for measuring a capacitance value corresponding to the deflection of the diaphragm, the deflection being correlated to a pressure difference, the pressure difference being equivalent to a pressure of volume (Pv) of said gas held in the chamber;
• wherein an inlet valve is interfaced between a controller and the inlet port and said outlet valve is interfaced between the outlet port and the reactor,
• the controller is configured to close said inlet valve upon reaching a desired level in the pressure of volume (Pv) of said gas held in the chamber and cause opening of said outlet valve to provide a burst of said gas held in the chamber to said reactor.