Plasma generating apparatus using mutual inductive coupling and substrate treating apparatus comprising the same

A substrate treating apparatus, comprising:

• a process chamber including a first space for accommodating a substrate to be processed therein;
• a plasma generator configured to generate and provide plasma to provide the process chamber;
• and
• an exhaust configured to exhaust gases and reaction byproducts in the process chamber,
• wherein the plasma generator comprises,
• an RF power supply configured to supply an RF signal;
• a plurality of electromagnetic field applying units configured to induce an electromagnetic field by receiving the RF signal;
• a plasma chamber on the process chamber, the plasma chamber including a second space for accommodating the plurality of electromagnetic field applying units, the plasma chamber configured to generate plasma;
• and
• a reactance element coupled to a ground terminal,
• wherein each of the plurality of electromagnetic field applying units comprises a core structure made of a magnetic material and a plurality of coils, and the plurality of coils are inductively coupled with and physically separated from each other,
• the plurality of electromagnetic field applying units are arranged in series between the RF power supply and the reactance element,
• the core structure comprises a first core and a second core, the first core having a first loop shape, the first loop shape having a first opening that extends through the first core at a circumference thereof, the second core having a second loop shape, the second loop shape having a second opening that extends through the second core at a circumference thereof, an unopened portion of the second core being in contact with an unopened portion of the first core,
• wherein the first core comprises,
• a first sub core forming a half portion of the first loop shape, and
• a second sub core forming the remaining half portion of the first loop shape,
• wherein the second core comprises,
• a third sub core forming a half portion of the second loop shape, and
• a fourth sub core forming the remaining half portion of the second loop shape, and
• wherein a first insulator is provided between the first sub core and the second sub core, and
• a second insulator is provided between the third sub core and the fourth sub core.