Plasma processing apparatus

A plasma processing apparatus comprising:

• a processing chamber:
• a table disposed in the processing chamber;
• a dielectric window provided at the processing chamber;
• a slot plate provided on the dielectric window;
• and
• a surrounding body made of a dielectric material surrounding a processing space between the table and the dielectric window,
• wherein the dielectric window and the surrounding body are separated from each other in a vertical direction with a predetermined gap therebetween, and
• wherein an upper end portion of the surrounding body is closer to a center of the surrounding body than a main body of the surrounding body, the upper end portion extends in a vertical direction, a horizontal portion between the upper end portion and the main body extends toward the center of the surrounding body, a lower end of an outer periphery of the dielectric window which defines the predetermined gap is located at an outer side of the upper end portion and above the horizontal portion.