Distributed electrode array for plasma processing

A plasma source assembly, comprising:

• a reference electrode having an electrode surface, wherein the reference electrode is coupled to a ground;
• a power distribution element connected to a plurality of discrete electrodes, wherein the discrete electrodes are arranged in a pattern that is distributed in at least two non-parallel directions that are both parallel to an outer surface of the plasma source assembly, and each of the discrete electrodes includes an end that is disposed a first distance from the outer surface in a direction that is perpendicular to the outer surface;
• an RF signal generator that is configured to provide RF power to a first connection point on the power distribution element;
• and
• a circuit element that comprises one or more electrical reactance elements and is configured to allow a current to flow from a second connection point on the power distribution element to the ground.

A plasma source assembly, comprising:

• a reference electrode having an electrode surface, wherein the electrode surface has a central axis that is perpendicular to the electrode surface at a center point;
• and
• an array of discrete electrodes that are arranged in a spaced apart pattern that is parallel to a first plane, which is perpendicular to the central axis, wherein
• each of the discrete electrodes comprise a conductive rod that has a first end, a second end and a body disposed between the first end and the second end, wherein the body is aligned parallel to a first direction that is oriented at an angle greater than zero to the first plane, and
• each of the discrete electrodes includes an end that is disposed a distance from the electrode surface, wherein the distance is measured in a direction that is perpendicular to the first plane.