Conductive metal oxide structures in non-volatile re-writable memory devices
AssigneeUnity Semiconductor Corporation
InventorsLawrence Schloss, Julie Casperson Brewer, Wayne Kinney, Rene Meyer
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AssigneeUnity Semiconductor Corporation
InventorsLawrence Schloss, Julie Casperson Brewer, Wayne Kinney, Rene Meyer
Estimating the term…
A memory cell including a memory element comprising an electrolytic insulator in contact with a conductive metal oxide (CMO) is disclosed. The CMO includes a crystalline structure and can comprise a pyrochlore oxide, a conductive binary oxide, a multiple B-site perovskite, and a Ruddlesden-Popper structure. The CMO includes mobile ions that can be transported to/from the electrolytic insulator in response to an electric field of appropriate magnitude and direction generated by a write voltage applied across the electrolytic insulator and CMO. The memory cell can include a non-ohmic device (NOD) that is electrically in series with the memory element. The memory cell can be positioned between a cross-point of conductive array lines in a two-terminal cross-point memory array in a single layer of memory or multiple vertically stacked layers of memory that are fabricated over a substrate that includes active circuitry for data operations on the array layer(s).
An integrated circuit comprising:
A memory device comprising:
A system comprising:
Dependencies are inferred from the claim text.