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US 10,311,938 B2Granted
Compact system with memory and PMU integration
AssigneeApple Inc.
InventorSanjay Dabral
Life of this patent
Estimating the term…
Abstract
One or more integrated circuits including at least one integrated circuit that is fabricated in a DRAM fabrication process. Capacitors in the DRAM-fabricated integrated circuit can be used for decoupling for logic components of the integrated circuits, and may be used for fine-grain on-chip PMUs. Embedded DRAM memories can be used instead of SRAM memories, with increased density and reduced leakage. More compact systems can be implemented using the integrated circuits.
Claims19
A system comprising:
- a first integrated circuit comprising one or more logic circuit components, the first integrated circuit implemented on a first semiconductor die manufactured using a logic circuit fabrication process;
- and
- a second integrated circuit coupled to the first integrated circuit, wherein the second integrated circuit is manufactured using a dynamic random access memory (DRAM) fabrication process and is implemented on a second semiconductor die that is separate from the first semiconductor die, and the second integrated circuit comprises:
- a plurality of capacitors constructed on the second semiconductor die, wherein the plurality of capacitors are coupled to a plurality of power supply grids on the first integrated circuit to provide decoupling capacitance for the one or more logic circuit components on the first semiconductor die, wherein the plurality of supply grids comprise a local, switched power supply grid for power gating and a global, unswitched power supply grid;
- and
- a plurality of power management units on the second semiconductor die and configured to provide a power supply to respective ones of the one or more logic circuit components on the first integrated circuit, wherein each power management unit of the plurality of power management units comprises:
- a voltage regulator configured to generate the voltage on the power supply, wherein the voltage regulator comprises one or more second capacitors formed using the DRAM fabrication process;
- and
- a register that is programmable with a magnitude of the voltage to be generated by the voltage regulator, and wherein the register is changeable during use to change the magnitude.
6 more elements
An apparatus comprising:
- a first integrated circuit comprising one or more logic circuit components, the first integrated circuit implemented on a first semiconductor die manufactured using a logic circuit fabrication process;
- and
- a second integrated circuit coupled to the first integrated circuit, wherein the second integrated circuit is manufactured using a dynamic random access memory (DRAM) fabrication process and is implemented on a second semiconductor die that is separate from the first semiconductor die, and the second integrated circuit comprises:
- a plurality of capacitors constructed on the second semiconductor die, wherein the plurality of capacitors are coupled to a plurality of power supply grids on the first integrated circuit to provide decoupling capacitance for the one or more logic circuit components on the first semiconductor die, wherein the plurality of supply grids comprise a local switched power supply grid for power gating and a global unswitched power supply grid;
- and
- a plurality of power management units, wherein each power management unit comprises:
- a voltage regulator configured to generate a voltage on a power supply for the first integrated circuit, wherein the voltage regulator comprises one or more second capacitors formed using the DRAM fabrication process;
- and
- a register that is programmable with a magnitude of the voltage to be generated by the voltage regulator, and wherein the register is changeable during use to change the magnitude.
6 more elements
A system comprising:
- a plurality of integrated circuits included in an integrated circuit package, wherein:
- at least a first integrated of the plurality of integrated circuits is manufactured using a dynamic random access memory (DRAM) fabrication process;
- at least a second integrated circuit of the plurality of integrated circuits is fabricated using a different fabrication process than the DRAM fabrication process, wherein the first integrated circuit is implemented on a first semiconductor die and the second integrated circuit is implemented on a second semiconductor die that is separate from the first semiconductor die;
- the first integrated circuit comprises a plurality of capacitors constructed on the first semiconductor die that are coupled to a plurality of power supply grids on the second integrated circuit to serve as decoupling capacitance for logic circuits incorporated into the plurality of integrated circuits, including logic circuits incorporated into the second integrated circuit on the second semiconductor die, wherein the plurality of supply grids comprise a local switched power supply grid for power gating and a global unswitched power supply grid;
- and
- the first integrated circuit further comprises a plurality of power management units on the first semiconductor die and configured to provide a power supply to the first integrated circuit, wherein each power management unit of the plurality of power management units comprises:
- a voltage regulator configured to generate the voltage on the power supply, wherein the voltage regulator comprises one or more second capacitors formed using the DRAM fabrication process;
- and
- a register that is programmable with a magnitude of the voltage to be generated by the voltage regulator, and wherein the register is changeable during use to change the magnitude.
6 more elements
Dependencies are inferred from the claim text.