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US 10,310,387 B2Granted
Dynamic patterning method that removes phase conflicts and improves pattern fidelity and CDU on a two phase-pixelated digital scanner
AssigneeNikon Corporation
InventorsShane R. Palmer, Julia A. Sakamoto, Donis G. Flagello
Life of this patent
Estimating the term…
Abstract
Phase conflicts in pattern transfer with phase masks can be resolve by exposing pattern features with a first pattern and a second pattern, wherein the second pattern is selected based on the phase conflicts. In scanned exposures using pulsed lasers, a number of exposures of the second pattern can be less than 20% of a total number of exposures.
Claims17
An exposure apparatus which exposes a workpiece with an exposure light from a light source, comprising:
- a spatial light modulator including a plurality of optical elements situated in an optical path of the exposure light;
- and
- a controller which is configured to control the spatial light modulator so as to set each of the plurality of optical elements of the spatial light modulator to a first state or a second state,
- wherein the controlling comprises:
- setting an optical element from the plurality of optical elements positioned in a first area of the spatial light modulator to the first state so as to expose a first exposure region on the workpiece with a first exposure light from the optical elements in the first area;
- setting an optical element from the plurality of optical elements positioned in a second area of the spatial light modulator to the second state so as to expose a second exposure region on the workpiece with a second exposure light from the optical element in the second area, wherein the second area partially adjoins the first area, and wherein the first exposure region and the second exposure region on the workpiece are not adjacent;
- and
- setting a first group of optical elements from the plurality of optical elements positioned in a third area of the spatial light modulator that includes an area where the first area and the second area are in contact to the first state, and a second group of optical elements from the plurality of optical elements positioned in the third area to the second state, so as to expose a third exposure region on the workpiece between the first exposure region and the second exposure region with a third exposure light.
5 more elements
An exposure method which exposes a workpiece with an exposure light from a plurality of optical elements of a programmable array, the method comprising:
- setting an optical element from the plurality of optical elements positioned in a first area of the programmable array to a first state so as to expose a first exposure region on the workpiece with a first exposure light from the optical element in the first area;
- setting an optical element from the plurality of optical elements positioned in a second area of the programmable array to the second state so as to expose a second exposure region on the workpiece with a second exposure light from the optical element in the second area;
- and
- setting a first group of optical elements from the plurality of optical elements positioned in a third area of the programmable array that includes a part of the first area and a part of the second area to the first state, and a second group of optical elements from the plurality of optical elements positioned in the third area to the second state, so as to expose a third exposure region of the workpiece situated between the first exposure region and the second exposure region with a third exposure light.
1 more element
An exposure method which exposes a workpiece with an exposure light from a plurality of optical elements of a programmable array, the method comprising:
- setting an optical element from the plurality of optical elements positioned in a first area of the programmable array to a first state so as to expose a first exposure region on the workpiece with a first exposure light from the optical element in the first area;
- setting an optical element from the plurality of optical elements positioned in a second area of the programmable array to the second state so as to expose a second exposure region on the workpiece with a second exposure light from the optical element in the second area, wherein the first area and the second area are at least partially adjacent, and wherein the first exposure region and the second exposure region are not at least partially adjacent;
- and
- in a third area of the programmable array which includes a part of the first area and a part of the second area, forming a bridging pattern by setting a first group of optical elements from the plurality of optical elements to the first state and a second group of optical elements from the plurality of optical elements to the second state, so as to expose a third exposure region of the workpiece situated between the first exposure region and the second exposure region with a third exposure light.
1 more element
Dependencies are inferred from the claim text.