All reflective wafer defect inspection and review systems and methods

An objective optics system for reflecting Infrared to vacuum ultra-violet (VUV) spectral band light that is reflected from a target substrate in response to Infrared to VUV light that illuminates the target substrate, the system comprises:

• a first mirror arranged to receive and reflect Infrared to VUV light that is reflected from the target substrate,
• a second mirror arranged to receive and reflect VUV light that is reflected by the first mirror, wherein the first and second mirrors are arranged and shaped so as to reflect Infrared to VUV light from the target substrate towards an optical axis of the apparatus, wherein the numerical aperture (NA) for the reflected Infrared to Vacuum UV spectral light received at the second mirror is larger than the NA for the reflected Infrared to Vacuum UV spectral light received at the first mirror so as to result in a working distance for the objective optics greater than 10 mm,
• a third mirror arranged to receive and reflect Infrared to VUV light that is reflected by the second mirror, wherein the first and second mirrors are arranged to form an intermediate image between the second and third mirror, and
• a fourth mirror arranged to receive and reflect the Infrared to VUV light that is reflected by the third mirror towards the sensor.

An apparatus for reflecting, towards a sensor, Infrared to vacuum ultra-violet (VUV) light that is reflected from a target substrate, the apparatus comprising:

• an illumination source for generating Infrared to VUV light that illuminates a target substrate;
• objective optics for receiving and reflecting Infrared to VUV light that is reflected from the target substrate in response to the generated Infrared to VUV spectral band light that illuminates the target substrate;
• and
• a sensor for detecting Infrared to VUV light that is reflected by the objective optics,
• wherein the objective optics comprises
• a first mirror arranged to receive and reflect Infrared to VUV light that is reflected from the target substrate, and
• a second mirror arranged to receive and reflect Infrared to VUV light that is reflected by the first mirror towards the sensor, wherein the first and second mirrors are arranged and shaped so as to reflect Infrared to VUV light from the target substrate towards an optical axis of the apparatus, wherein the ray numerical aperture (NA) increases on the second mirror as compared to on the first mirror so as to result in a working distance for the objective optics that is greater than 10 mm.