Cobalt-containing compounds, their synthesis, and use in cobalt-containing film deposition

A method of depositing a cobalt-containing film, the method comprising:

• introducing a cobalt-containing compound into a reactor having a substrate disposed therein, wherein the cobalt-containing compound has the following formula:
• wherein each of R1, R2, and R3 is independently selected from the group consisting of hydrogen and linear, cyclic, or branched hydrocarbon groups;
• provided that (a) R1, R2, and R3 are a C2 to C4 hydrocarbon when R1═R2═R3, (b) R1 and R2 are a hydrocarbon group when R3 is H, or (c) R1 is a hydrocarbon group when R2 and R3 are H;
• introducing a reaction gas into the reactor at the same time or at an alternate time as the introduction of the cobalt-containing compound;
• and
• depositing at least part of the cobalt-containing compound onto the substrate to form the cobalt-containing film.