Deposition device and deposition method

A deposition device comprising:

• a processing container;
• an exhaust device configured to depressurize an internal pressure of the processing container;
• a mounting table, having a disc shape, installed inside the processing container and configured to mount a target object thereon;
• a metal target installed above the mounting table;
• a first gas supply part configured to supply a gas into the processing container;
• a power supply configured to generate power such that positive ions in the gas supplied from the first gas supply part collide against the metal target;
• a second gas supply part configured to supply an oxidizing gas;
• a head, having a disc shape, connected to the second gas supply part, including a plurality of gas injection ports arranged to open downward toward the mounting table, and configured to inject the oxidizing gas toward the mounting table, the head overlapping with an entire surface of the mounting table;
• and
• a head driving mechanism configured to move the head between a first region that is defined between the metal target and a mounting region where the target object is mounted on the mounting table and a second region spaced apart from a space defined between the metal target and the mounting region,
• wherein the head driving mechanism places the head in the second region while a metal emitted from the metal target is deposited on the target object, and places the head in the first region while the oxidizing gas is injected toward the mounting table.