Manufacturing method of micro-nano structure antireflective coating layer and display apparatus thereof
AssigneeWuhan China Star Optoelectronics Technology Co., Ltd.
InventorGuowei Zha
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Abstract
A manufacturing method of micro-nano structure antireflective coating layer and a display apparatus thereof are described. The method includes providing a substrate, forming a silicon oxide layer on the substrate, forming a graphene layer with a hexagonal honeycomb lattice on the silicon oxide layer, and forming a bottom surface of the antireflective coating layer in the nucleation points by serving the graphene layer as a growing base layer, wherein a diffusion length and an atomic mass of diffusion atoms of the antireflective coating layer are decreased with time by a gradient growing manner to form a upper surface of the antireflective coating layer.
Claims14
A method of manufacturing a micro-nano structure antireflective coating layer, comprising:
- providing a substrate;
- forming a silicon oxide layer on the substrate, wherein the silicon oxide layer comprises a plurality of holes which provide a plurality of nucleation points of an antireflective coating layer;
- forming a graphene layer with a hexagonal honeycomb lattice on the silicon oxide layer;
- and
- forming a bottom surface of the antireflective coating layer in the nucleation points whereby the graphene layer serves as a growing base layer so that the bottom surface is a hexagonal shape, wherein a diffusion length and an atomic mass of diffusion atoms of the antireflective coating layer are decreased with time by a gradient growing manner to form a upper surface of the antireflective coating layer;
- wherein the gradient growing manner comprises a growth temperature adjustment and a control concentration of a growth source, and wherein a material of the antireflective coating layer is either zinc oxide or silicon.
A method of manufacturing a micro-nano structure antireflective coating layer, comprising:
- providing a substrate;
- forming a silicon oxide layer on the substrate, wherein the silicon oxide layer comprises a plurality of holes which provide a plurality of nucleation points of an antireflective coating layer;
- forming a graphene layer with a hexagonal honeycomb lattice on the silicon oxide layer;
- and
- forming a bottom surface of the antireflective coating layer in the nucleation points whereby the graphene layer serves as a growing base layer so that the bottom surface is a hexagonal shape, wherein a diffusion length and an atomic mass of diffusion atoms of the antireflective coating layer are decreased with time by a gradient growing manner to form a upper surface of the antireflective coating layer.
Dependencies are inferred from the claim text.