Reflective element for mask blank and process for producing reflective element for mask blank
AssigneeAGC Inc.
InventorToshiyuki Uno
Life of this patent
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Abstract
A process for producing a reflective element for a mask blank, of which a reflective layer is hardly damaged at the time of etching treatment of an absorber layer. A process for producing a reflective element for a mask blank, which comprises (1) a step of forming a reflective layer on a first surface of a substrate, (2) a step of forming a first protective layer on the reflective layer, (3) a step of cleaning the substrate to form an exposed part of the reflective layer, which is not covered with the first protective layer, and (4) a step of forming a second protective layer on the first surface of the substrate to cover the exposed part of the reflective layer with the second protective layer.
Claims21
A process for producing a reflective element suitable for a mask blank, the process comprising:
- (1) forming a reflective layer on a first surface of a substrate,
- (2) forming a first protective layer on the reflective layer,
- (3) cleaning the substrate to form an exposed part of the reflective layer, wherein the exposed part is not covered with the first protective layer, and
- (4) forming a second protective layer on a first surface side of the substrate to cover the exposed part with the second protective layer.
A reflective element, comprising:
- a substrate having a first surface,
- a reflective layer formed on the first surface, and
- a protective layer formed on the reflective layer,
- wherein the protective layer has a first layer and a second layer, and
- the second layer covers an exposed part of the reflective layer where the first layer does not exist.
Dependencies are inferred from the claim text.