Masking systems and methods
AssigneePDS IG Holding LLC
InventorPaul Trpkovski
Life of this patent
Estimating the term…
Abstract
Embodiments provide systems, methods, and masking workstations for masking a planar substrate with a shield. The shield is configured to facilitate the removal of a waste portion of masking material from a portion of a planar substrate. In some cases the shield is placed adjacent to a substrate and a masking material is applied to the substrate and at least a portion of the shield. A waste portion is separated from the masking material and the shield removes the waste portion. Embodiments can be useful for masking only a portion of a planar substrate, including glass panes and glass units, for example.
Claims14
A masking workstation for masking a glass unit, comprising:
- a support surface configured to support the glass unit having a substrate surface;
- a shield positionable in a first position away from the support surface and a second position proximate to the support surface and to the glass unit supported by the support surface;
- and
- a movement mechanism coupled to the shield, wherein the movement mechanism is configured to provide the shield with a range of motion including the first position and the second position;
- wherein in the second position the shield is positionable over only a portion of the support surface.
A system for masking a planar substrate, comprising:
- a workstation comprising a support surface configured to support the planar substrate having a substrate surface;
- a shield positionable in a first position away from the support surface and a second position proximate to the support surface and to the planar substrate supported by the support surface;
- an applicator configured to apply a piece of masking material to the substrate surface and to the shield in the second position;
- a cutting tool configured to cut the piece of masking material to separate a waste portion of masking material from a retained portion of masking material;
- and
- a movement mechanism configured to provide the shield with a range of motion between the first position and a second position;
- wherein the shield is further configured to remove the waste portion of masking material from the substrate surface as the shield moves from the second position to the first position.
A workstation for masking a planar substrate, comprising:
- a support surface configured to support the planar substrate having a substrate surface;
- a shield positionable in a first position away from the support surface and a second position proximate to the support surface and to the planar substrate supported by the support surface;
- a movement mechanism coupled to the shield, wherein the movement mechanism is configured to provide the shield with a range of motion including the first position and the second position;
- and
- an applicator configured to apply a strip of masking material to the substrate surface and to the shield in the second position.
Dependencies are inferred from the claim text.