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US 10,246,781 B2Granted
Method for removing a metal deposit placed on a surface in a chamber
OwnerJulien Vitiello, Jean-Luc Delcarri +1inventors
InventorsJulien Vitiello, Jean-Luc Delcarri, Fabien Piallat
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Abstract
A method for removing a metallic deposit disposed on a surface in a chamber, including the following steps: a) a step of oxidizing the metallic deposit; b) a step of injecting chemical species adapted to volatilized the oxidized metallic deposit, the step b) being implemented during at least a part of step a); and in step b), the chemical species are injected according to a sequence of pulses.
Claims15
A method for removing a copper deposit disposed on a surface in an enclosure, said method comprising the following steps:
- a. a step of flowing oxidizing species capable of oxidizing the copper deposit;
- and
- b. a step of flowing chemical species capable of volatilizing the oxidized copper deposit, said step b) being implemented during at least a part of said step a);
- and in step b), the chemical species are flowing according to a sequence of pulses;
- wherein during a first pulse of the sequence of pulses the oxidation of said step a) becomes a minority reaction and the oxidized copper deposit is volatized by the chemical species flowing in said step b);
- and
- wherein once said first pulse of the sequence of pulses has ended, the oxidation of the copper deposit is a dominant reaction until a next pulse of the sequence of pulses of said step b).
4 more elements
Dependencies are inferred from the claim text.