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US 10,246,730 B2Granted
Semiconductor manufactured nano-structures for microbe or virus trapping or destruction
AssigneeInternational Business Machines Corporation
InventorsYann Astier, David Esteban, Judson R. Holt, Henry K. Utomo
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Abstract
A method includes disposing a solution including a microbe or a virion on a surface of a semiconductor substrate, the semiconductor substrate having a trench extending from the surface to a region within the semiconductor substrate; wherein the the microbe or the virion is trapped within the trench of the semiconductor substrate.
Claims6
A method of damaging or destroying a microbe or a virion, the method comprising:
- forming an array of protrusions arranged on a semiconductor substrate by forming a diamond-shaped epitaxial growth on a surface of a semiconductor bar structure extending from a surface of the semiconductor substrate, the array of protrusions having nanoscale dimensions;
- disposing a solution comprising a microbe or virion onto the array of protrusions;
- and
- damaging or destroying the microbe or the virion;
- wherein forming the array of protrusions comprises patterning a hard mask on the semiconductor substrate to form an array of cube-shaped hard mask structures on the semiconductor substrate, recessing the semiconductor substrate to form trenches in the semiconductor substrate, performing a crystallographic etch to convert the trenches into inverted pyramid-shaped trenches, and removing remaining portions of the hard mask to form sharp protrusions.
2 more elements
Dependencies are inferred from the claim text.