Resin composition for underlayer film formation, layered product, method for forming pattern, imprint forming kit, and process for producing device

A resin composition for underlayer film formation which is used to form an underlayer film by being applied onto a base material, comprising:

• a first resin having a radical reactive group in a side chain;
• a second resin containing at least one selected from a fluorine atom and a silicon atom;
• and
• a solvent,
• wherein the second resin contains a repeating unit having a fluorine atom and a repeating unit represented by General Formula (CIII):
• wherein Rc31 represents a hydrogen atom, an alkyl group, a cyano group, or a CH2—O-Rac2 group;
• Rac2 represents a hydrogen atom, an alkyl group, or an acyl group;
• Rc32 represents a group having an alkyl group, a cycloalkyl group, an alkenyl group, a cycloalkenyl group, or an aryl group;
• and Lc3 represents a single bond or a divalent linking group;
• and
• the repeating unit having a fluorine atom contains at least one unit selected from the group consisting Formulae (C-Ia) to (C-Id):
• wherein R10 and R11 each independently represents a hydrogen atom, a fluorine atom, or an alkyl group;
• and W3 to W6 each independently represents an organic group containing at least one or more fluorine atoms.