US 10,246,586 B2Granted

Light-resistance improver

AssigneeDaicel-Evonik Ltd.

InventorsTatsuki Akashi, Mitsuteru Mutsuda

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Abstract

Provided is an additive that increases or improves a light resistance of anon-fluorinated thermoplastic resin (e.g., a super engineering plastic, such as an aromatic polyamide, a liquid crystal polyester, or an aromatic polyetherketone resin). The additive comprises a fluorine-containing resin. The fluorine-containing resin may be, for example, a fluorine-containing resin comprising a tetrafluoroethylene unit as a monomer unit, in particular, may be a tetrafluoroethylene copolymer (e.g., at least one member selected from the group consisting of a copolymer of tetrafluoroethylene and another fluorinated olefin, a copolymer of tetrafluoroethylene and a fluorinated vinyl ether, and a copolymer of tetrafluoroethylene, another fluorinated olefin and a fluorinated vinyl ether).

Claims5

Dependent claims

A method for improving the light resistance of a non-fluorinated thermoplastic resin, which comprises adding a light-resistance improver comprising a fluorine-containing resin to a non-fluorinated thermoplastic resin,

wherein the light-resistance improver forms a dispersed phase having an average particle diameter of 0.01 to 2 μm and an average interparticle distance of the dispersed phase is not more than 5 μm,
wherein the non-fluorinated thermoplastic resin comprises at least one member selected from the group consisting of an aromatic polyamide, a liquid crystal polyester, and an aromatic polyetherketone resin,
wherein the fluorine-containing resin comprises a tetrafluoroethylene copolymer and does not include a polytetrafluoroethylene, and
the ratio of the fluorine-containing resin relative to 100 parts by weight of the non-fluorinated thermoplastic resin is 10 to 20 parts by weight.

1 more element

Dependencies are inferred from the claim text.

Facts

Application: 14/779,226Filed 17 Oct 2013
Priority: JP 2013-08672017 Apr 2013
Published: US 2016/0046806 A118 Feb 2016
Granted: 2 Apr 2019
Term ends: Not estimatedThe source records don’t support an estimate.

Classification5 codes

C08L 71/00
Compositions of polyethers obtained by reactions forming an ether link in the
C08L 27/18
Containing fluorine atoms: homopolymers or copolymers or tetrafluoroethene
C08G 2650/40
Containing oxygen in addition to the ether group: containing ketone groups, e.g. polyarylethylketones, PEEK or PEK
C08L
Compositions of macromolecular compounds

Family

US 2016/0046806 A1Pre-grant publication · published 18 Feb 2016
US 10,246,586 B2This patent

From the US filing history. Foreign family members aren’t listed.

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