Chemical film on substrate and method of forming the same, method of forming paracyclophane containing functional ground with disulfide bond

Abstract

The present invention provides a method of forming paracyclyophane containing disulfide functional group. The paracyclophane is prepared by adding 3,3′-dithiodipropionic acid (DPDPA) and N-ethyl-N′-(3-(dimethylamino)propyl)carbodiimide (EDC) into 4-aminomethyl [2,2] paracyclophane. The present invention further provides a chemical film and a method of forming the same. The chemical film contains poly-p-xylylene with disulfide functional group and is formed on a substrate by a chemical vapor deposition process.

Dependencies are inferred from the claim text.