Device for producing ultrapure water
AssigneeVivonic GmbH
InventorManfred Völker
Life of this patent
Estimating the term…
Abstract
The device for producing ultrapure water according to the reverse osmosis principle with a reverse osmosis filter which is subdivided by the RO membrane into a primary chamber and a secondary chamber, with a primary circuit through which raw water is supplied to the primary chamber and concentrate is discharged therefrom, and with a secondary circuit for supplying permeate to at least one consumer, preferably to a dialysis device, is characterized in that a means for detecting organic and/or inorganic deposits is arranged in or on the primary circuit and/or the secondary circuit and is connected to an evaluation means.
Claims15
A device for producing ultrapure water according to a reverse osmosis (RO) principle with a reverse osmosis filter which is subdivided by a RO membrane into a primary chamber and a secondary chamber, with a primary circuit through which raw water is supplied to the primary chamber and concentrate is discharged therefrom, and with a secondary circuit for supplying permeate to at least one consumer,
- the device for producing ultrapure water comprising,
- a pump connected to a conduit of the primary circuit upstream of the reverse osmosis filter;
- a flow resistance means and a valve with a discharge outlet connected to a concentrate conduit of the primary circuit downstream of the reverse osmosis filter;
- a deposition layer detector arranged in or on a concentrate line of the primary circuit downstream of the primary chamber that detects a deposition layer of at least one of organic and inorganic deposits, the deposition layer detector being connected to a processor, the processor including a deposition layer evaluator;
- and
- a buffer vessel having a flexible, expandable volume incorporated into a permeate conduit of the secondary circuit,
- wherein the deposition layer evaluator is configured to determine a thickness measurement value of the deposition layer detected by the deposition layer detector;
- wherein the deposition layer detector comprises a sensor system;
- and
- wherein the sensor system is configured to initiate a back flushing of the RO membrane when the determined thickness measurement value reaches a predetermined limit measurement value, wherein the back flushing comprises the deposition layer evaluator causing the processor to stop the pump and open the valve to the discharge outlet, and further causing the processor to control the buffer vessel to produce a negative pressure on the RO membrane to cause a reverse flow via the RO membrane to the discharge outlet.
A device for producing ultrapure water according to a reverse osmosis (RO) principle with a reverse osmosis filter which is subdivided by a RO membrane into a primary chamber and a secondary chamber, with a primary circuit through which raw water is supplied to the primary chamber and concentrate is discharged therefrom, and with a secondary circuit for supplying permeate to at least one consumer,
- the device for producing ultrapure water comprising,
- a pump connected to a conduit of the primary circuit upstream of the reverse osmosis filter;
- a flow resistance means and a valve with a discharge outlet connected to a concentrate conduit of the primary circuit downstream of the reverse osmosis filter;
- a deposition layer detector arranged in or on a ring line of the secondary circuit downstream of the secondary chamber that detects a deposition layer of at least one of organic and inorganic deposits, the deposition layer detector being connected to a processor, the processor including a deposition layer evaluator;
- and
- a buffer vessel having a flexible, expandable volume incorporated into a permeate conduit of the secondary circuit,
- wherein the deposition layer evaluator is configured to determine a thickness measurement value of the deposition layer detected by the deposition layer detector;
- wherein the deposition layer detector comprises a sensor system;
- and
- wherein the sensor system is configured to initiate a back flushing of the RO membrane when the determined thickness measurement value reaches a predetermined limit measurement value, wherein the back flushing comprises the deposition layer evaluator causing the processor to stop the pump and open the valve to the discharge outlet, and further causing the processor to control the buffer vessel to produce a negative pressure on the RO membrane to cause a reverse flow via the RO membrane to the discharge outlet.
A device for producing ultrapure water according to a reverse osmosis (RO) principle with a reverse osmosis filter which is subdivided by a RO membrane into a primary chamber and a secondary chamber, with a primary circuit through which raw water is supplied to the primary chamber and concentrate is discharged therefrom, and with a secondary circuit for supplying permeate to at least one consumer,
- the device for producing ultrapure water comprising,
- a pump connected to a conduit of the primary circuit upstream of the reverse osmosis filter;
- a flow resistance means and a valve with a discharge outlet connected to a concentrate conduit of the primary circuit downstream of the reverse osmosis filter;
- a deposition layer detector arranged in or on a ring line of the secondary circuit downstream of a consumer line connected to the secondary chamber that detects a deposition layer of at least one of organic and inorganic deposits, the deposition layer detector being connected to a processor, the processor including a deposition deposit layer evaluator;
- and
- a buffer vessel having a flexible, expandable volume incorporated into a permeate conduit of the secondary circuit,
- wherein the deposition layer evaluator is configured to determine a thickness measurement value of the deposition layer detected by the deposition layer detector;
- wherein the deposition layer detector comprises a sensor system;
- and
- wherein the sensor system is configured to initiate a back flushing of the RO membrane when the determined thickness measurement value reaches a predetermined limit measurement value, wherein the back flushing comprises the deposition layer evaluator causing the processor to stop the pump and open the valve to the discharge outlet, and further causing the processor to control the buffer vessel to produce a negative pressure on the RO membrane to cause a reverse flow via the RO membrane to the discharge outlet.
Dependencies are inferred from the claim text.