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US 10,245,820 B2Granted
Forming sacrificial structures using phase-change materials that sublimate
AssigneePalo Alto Research Center Incorporated
InventorsTse Nga Ng, Bing R. Hsieh, Steven E. Ready
Life of this patent
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Abstract
A structure can include a first layer of a polymer material and a second layer of the polymer material on the first layer, the first and second layers of the polymer material defining a hollow space that was formed by way of a temporary sacrificial structure that was made of a sublimable material.
Claims18
A method, comprising:
- depositing a first layer of a polymer material;
- depositing a first amount of sublimable material on the first layer of the polymer material to form a first sacrificial structure, wherein the sublimable material includes cyclododecane;
- depositing a second layer of the polymer material on the first amount of sublimable material and first layer of the polymer material;
- and
- removing the sublimable material to form a channel defined by the first and second layers of the polymer material.
2 more elements
A method, comprising:
- depositing a first layer of a polymer material;
- depositing a first amount of sublimable material on the first layer of the polymer material to form a first sacrificial structure;
- depositing a second layer of the polymer material on the first amount of sublimable material and first layer of the polymer material;
- removing the first amount of sublimable material to form a first hollow space defined by the first and second layers of the polymer material;
- depositing a second amount of sublimable material on the first layer of the polymer material to form a second sacrificial structure;
- depositing a third layer of the polymer material on the second amount of sublimable material and first layer of the polymer material;
- and
- removing the sublimable material to form a second hollow space defined by the first and third layers of the polymer material.
5 more elements
A method, comprising:
- depositing a first layer of a polymer material;
- depositing a first amount of sublimable material on the first layer of the polymer material to form a first sacrificial structure;
- depositing a second layer of the polymer material on the first amount of sublimable material and first layer of the polymer material;
- removing the first amount of sublimable material to form a first hollow space defined by the first and second layers of the polymer material;
- depositing a second amount of sublimable material on the second layer of the polymer material to form a second sacrificial structure;
- depositing a third layer of the polymer material on the second amount of sublimable material and second layer of the polymer material;
- and
- removing the second amount of sublimable material to form a second hollow space defined by the second and third layers of the polymer material.
5 more elements
Dependencies are inferred from the claim text.