Gas flow device for a system for the radiation treatment of substrates

A system for the radiation treatment of substrates, comprising:

• at least one radiation source positioned above substrate holders in a chamber, which holders are to be equipped with substrates that are to be treated, and the chamber maintains a gas flow that is built up in the chamber and flows past the substrates after entering the chamber, and the gas flow does not previously flow past the at least one radiation source, the chamber having at least one gas inlet and at least one gas outlet, wherein the gas inlet and gas outlet include elements that have flow conduits that become narrower in a flow direction and then widen out again toward a downstream end, as a result of which during operation of the system, a laminar flow prevails and therefore deposits due to turbulence phenomena do not occur, and wherein the gas inlet and the gas outlet have lugs in an upper part, which hold two respective gas inlet and/or gas outlet devices together to maintain the laminar flow in a region in the upper part as well.