Imprint apparatus, imprint method, and article manufacturing method

An imprint method of performing an imprint process of forming a pattern for a shot region on a substrate by bringing an imprint material on the substrate and a mold into contact with each other using an imprint apparatus which includes a stage configured to hold the substrate, and a detector configured to detect a displacement in a relative position between the shot region on the substrate and the mold in a direction parallel to a surface of the substrate when performing the imprint process for the shot region, the method comprising steps of:

• obtaining, when performing the imprint process for a first shot region of the plurality of shot regions, information relating to the displacement in the relative position between the first shot region on the substrate and the mold detected by the detector or a relative moving amount of the first shot region relative to the mold, which was used for aligning the first shot region and the mold with each other in the direction parallel to the surface of the substrate, after bringing the mold and the imprint material on the substrate into contact with each other;
• adjusting, when performing the imprint process for a second shot region of the plurality of shot regions, the relative position between the second shot region and the mold in the direction parallel to the surface of the substrate based on the obtained information relating to the displacement in the relative position between the first shot region on the substrate and the mold detected by the detector or the relative moving amount of the first shot region relative to the mold;
• and
• bringing the mold and the imprint material on the second shot region into contact with each other to perform the imprint process for the second shot region.

An article manufacturing method, the method comprising:

• forming a pattern on a substrate using an imprint apparatus;
• and
• processing the substrate on which the pattern has been formed to manufacture the article,
• wherein the imprint apparatus performs an imprint process of forming a pattern on an imprint material for a shot region of a plurality of shot regions on a substrate by bringing the imprint material on the substrate and a mold into contact with each other, the apparatus including:
• a stage configured to hold the substrate;
• a detector configured to detect a displacement in a relative position between the shot region and the mold in a direction parallel to a surface of the substrate when performing the imprint process for the shot region;
• and
• a controller configured to control the imprint process,
• wherein the controller is configured to:
• obtain, when performing the imprint process for a first shot region of the plurality of shot regions, information relating to the displacement in the relative position between the first shot region on the substrate and the mold detected by the detector or a relative moving amount of the first shot region relative to the mold, which was used for aligning the first shot region and the mold with each other in the direction parallel to the surface of the substrate, after bringing the mold and the imprint material on the substrate into contact with each other;
• adjust, when performing the imprint process for a second shot region of the plurality of shot regions, the relative position between the second shot region and the mold in the direction parallel to the surface of the substrate based on the obtained information relating to the displacement in the relative position between the first shot region on the substrate and the mold detected by the detector or the relative moving amount of the first shot region relative to the mold;
• and
• bring the mold and the imprint material on the substrate into contact with each other to perform the imprint process for the second shot region.