Illumination system having a beam deflection array for illuminating a mask in a microlithographic projection exposure apparatus
AssigneeCarl Zeiss SMT GmbH
InventorsMarkus Deguenther, Michael Layh
Life of this patent
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Abstract
An illumination system for illuminating a mask in a scanning microlithographic projection exposure apparatus has an objective with an object plane, at least one pupil surface and an image plane in which a mask can be arranged. A beam deflection array of reflective or transparent beam deflection elements is provided, where each beam deflection element is adapted to deflect an impinging light ray by a deflection angle that is variable in response to a control signal. The beam deflection elements are arranged in or in close proximity to the object plane of the objective.
Claims19
A system having an object plane and an image plane, the system comprising:
- a beam deflection array comprising beam deflection elements,
- wherein:
- the beam deflection elements are individually controllable;
- the beam deflection elements are arranged in or in close proximity to the object plane of the system;
- and
- the system is an illumination system configured so that, during use of the system in a scanning microlithographic projection exposure apparatus:
- a mask is present in the image plane of the system;
- and
- light emerging from a point in the object plane of the system converges to a conjugated point in the image plane of the system, and
- wherein:
- each beam deflection element has only a first state and a second state;
- and
- during use of the system in the scanning microlithographic projection exposure apparatus, a light beam deflected from a beam deflection element that is in the first state passes a pupil plane of the system, and a light beam deflected from a beam deflection element that is in the second state does not pass the pupil plane.
A system having an object plane and an image plane, the system comprising:
- a beam deflection array comprising beam deflection elements;
- and
- a raster element,
- wherein:
- the beam deflection elements are individually controllable;
- the beam deflection elements are arranged in or in close proximity to the object plane of the system;
- and
- the system is an illumination system configured so that, during use of the system in a scanning microlithographic projection exposure apparatus:
- a mask is present in the image plane of the system;
- light emerging from a point in a plane in which the raster element is arranged converges to a conjugated point in the image plane of the system;
- and
- light emerging from a point in the object plane of the system converges to a conjugated point in the image plane of the system, and
- wherein:
- each beam deflection element has only a first state and a second state;
- and
- during use of the system in the scanning microlithographic projection exposure apparatus, a light beam deflected from a beam deflection element that is in the first state passes a pupil plane of the system, and a light beam deflected from a beam deflection element that is in the second state does not pass the pupil plane.
Dependencies are inferred from the claim text.