Mechanical isolation control for an extreme ultraviolet (EUV) pellicle
AssigneeInternational Business Machines Corporation
InventorDario L. Goldfarb
Life of this patent
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Abstract
Systems and methods for isolating a membrane during fabrication. The membrane is connected to a substrate wafer using a plurality of magnets of uniform dimensions formed into two or more magnet stack beams. The magnet stack beams provide a gap between the wafer and the membrane. The wafer connected to the membrane by the magnet stack beams is received by a substrate holder so that a space is present between the membrane and the substrate holder. The membrane is rinsed by immersing, soaking, and withdrawing the substrate holder and the wafer connected to the membrane by the magnet stack beams using a rinse bath solution.
Claims20
A method for isolating a membrane during fabrication, comprising:
- connecting the membrane to a substrate wafer using a plurality of magnets of uniform dimensions formed into two or more magnet stack beams, the magnet stack beams providing a gap between the wafer and the membrane;
- receiving the wafer connected to the membrane by the magnet stack beams with a substrate holder so that a space is present between the membrane and the substrate holder;
- and
- rinsing the membrane by immersing, soaking, and withdrawing the substrate holder and the wafer connected to the membrane by the magnet stack beams using a rinse bath solution.
A method for rinsing a plurality of membranes during fabrication, comprising:
- connecting a membrane to a substrate wafer using a plurality of magnets of uniform dimensions formed into two or more magnet stack beams, the magnet stack beams providing a gap between the wafer and the membrane;
- receiving the wafer connected to the membrane by the magnet stack beams with a substrate holder so that a space is present between the membrane and the substrate holder;
- connecting one or more barriers to the substrate holder by interposing the one or more barriers between adjacent membranes;
- and
- rinsing the membrane by immersing, soaking, and withdrawing the substrate holder and the wafer connected to the membrane by the magnet stack beams using a rinse bath solution.
A method for isolating a membrane during fabrication, comprising:
- connecting the membrane to a substrate wafer using a plurality of magnets formed into two or more magnet stack beams, the magnet stack beams providing a gap between the wafer and the membrane;
- receiving the wafer connected to the membrane by the magnet stack beams with a substrate holder so that a space is present between the membrane and the substrate holder;
- and
- rinsing the membrane by immersing, soaking, and withdrawing the substrate holder and the wafer connected to the membrane by the magnet stack beams using a rinse bath solution.
Dependencies are inferred from the claim text.