Film formation device
AssigneeToshiba Mitsubishi-Electric Industrial Systems Corporation
InventorsHiroyuki Orita, Takahiro Shirahata, Akio Yoshida
Life of this patent
Estimating the term…
Loading patent…
AssigneeToshiba Mitsubishi-Electric Industrial Systems Corporation
InventorsHiroyuki Orita, Takahiro Shirahata, Akio Yoshida
Estimating the term…
The present invention includes a mist generator that generates a mist of a raw material of a film to be formed, and a mist jet nozzle that jets the mist generated by the mist generator to a substrate on which a film is to be formed. The mist jet nozzle includes: a main body having a hollow portion; a mist supply port that supplies the mist; a spout that jets the mist to the outside; a carrier gas supply port that supplies a carrier gas; and a shower plate having a plurality of holes formed therein. By the arrangement of the shower plate, the hollow portion is divided into a first space connected to the carrier gas supply port and a second space connected to the spout. The mist supply port is connected to the second space.
A film formation device comprising:
Dependencies are inferred from the claim text.