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US 10,121,923 B2Granted
Laminate and thin-film solar cell comprising same
AssigneeLG Chem, Ltd.
InventorsHee Han, Kyungjun Kim
Life of this patent
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Abstract
The present invention relates to a laminate including an alkali metal-doped layer. The laminate is processable at high temperatures of at least 550° C. and has excellent durability and barrier properties. Due to these advantages, the laminate can be used to fabricate a thin film solar cell with high flexibility and improved energy conversion efficiency. The present invention also relates to a thin film solar cell including the laminate.
Claims4
A method for producing a laminate, comprising sequentially:
- forming a polyimide layer on one surface of a metal base layer by polymerizing a tetracarboxylic dianhydride with a diamine to prepare a polyamic acid, casting a polyimide varnish comprising the polyamic acid on one surface of the metal base layer, and imidizing the polyamic acid;
- or subjecting the polyimide varnish to imidization to form a polyimide film and laminating the polyimide film on the metal base layer;
- and then
- forming a coating layer comprising an alkali metal source on one surface of the imidized polyimide layer, followed by forming an alkali metal-doped layer by a soft-baking process at 80 to 150° C. and a hard-baking process at 150 to 500° C. so that only the alkali metal is doped on one surface of the polyimide layer,
- wherein the coating layer is formed by coating with an alkali metal doping solution consisting essentially of an alkali metal source and a glycol-based organic solvent,
- wherein the glycol-based organic solvent is selected from at least one of ethylene glycol, diethylene glycol, propyleneglycol, dipropylene glycol, butylene glycol, 2,3-dibutyleneglycol and glycerol.
3 more elements
A method for producing a laminate, comprising sequentially:
- forming a polyimide layer on one surface of a metal base layer by polymerizing a tetracarboxylic dianhydride with a diamine to prepare a polyamic acid, casting a polyimide varnish comprising the polyamic acid on one surface of the metal base layer, and imidizing the polyamic acid;
- or subjecting the polyimide varnish to innidization to forma polyimide film and laminating the polyimide film on the metal base layer;
- and then
- forming a coating layer comprising an alkali metal source on one surface of the imidized polyimide layer, followed by forming an alkali metal-doped layer by a soft-baking process at 80 to 150° C. and a hard-baking process at 150 to 500° C. so that only the alkali metal is doped on one surface of the polyimide layer,
- wherein the coating layer is formed by coating with an alkali metal doping solution consisting essentially of an alkali metal source, a glycol-based organic solvent, and another solvent,
- wherein the glycol-based organic solvent is selected from at least one of ethylene glycol, diethylene glycol, propyleneglycol, dipropylene glycol, butylene glycol, 2,3-dibutyleneglycol and glycerol,
- wherein the another solvent is selected from the group consisting of propylene glycol monomethyl ether acetate (PGMEA), butyl acetate, ethyl lactate, and butyl lactate.
4 more elements
Dependencies are inferred from the claim text.