Galvanic isolation device
AssigneeTexas Instruments Incorporated
InventorsBenjamin Stassen Cook, Barry Jon Male, Robert Alan Neidorff
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AssigneeTexas Instruments Incorporated
InventorsBenjamin Stassen Cook, Barry Jon Male, Robert Alan Neidorff
Estimating the term…
A galvanic isolation device includes a first integrated circuit (IC) die that has communication circuitry formed in a circuit layer below the top surface. A first conductive plate is formed on the IC die proximate the top surface, and is coupled to the communication circuitry. A dielectric isolation layer is formed over a portion of the top surface of the IC after the IC is fabricated such that the dielectric isolation layer completely covers the conductive plate. A second conductive plate is juxtaposed with the first conductive plate but separated by the dielectric isolation layer such that the first conductive plate and the second conductive plate form a capacitor. The second conductive plate is configured to be coupled to a second communication circuit.
A galvanic isolation device comprising:
A galvanic isolation device comprising:
A galvanic isolation device comprising:
A galvanic isolation device comprising:
Dependencies are inferred from the claim text.