Vacuum processing apparatus
AssigneeHitachi High-Technologies Corporation
InventorsYoshifumi Ogawa, Masanori Kadotani, Masakazu Isozaki, Nobuhide Nunomura
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AssigneeHitachi High-Technologies Corporation
InventorsYoshifumi Ogawa, Masanori Kadotani, Masakazu Isozaki, Nobuhide Nunomura
Estimating the term…
The present invention provides a vacuum processing apparatus that includes gas supply means having a hard interlock of a pair of gas valves. The present invention provides a vacuum processing apparatus including: a gas supply unit that supplies gas, for performing vacuum processing using normally closed type air-driven valves, to a processing chamber where the vacuum processing is performed, the gas supply unit having an interlock function in which, when a first valve of a pair of the air-driven valves is opened, a second valve of the pair is closed, the gas supply unit including an air circuit that controls air for driving the air-driven valves, the air circuit being configured using an electromagnetic valve having a solenoid coil corresponding to each of the pair of the air-driven valves.
A vacuum processing apparatus comprising:
A vacuum processing apparatus comprising:
Dependencies are inferred from the claim text.