Substrate processing apparatus

A substrate processing apparatus in which a mounting table configured to mount a substrate and a gas supply part configured to supply a processing gas for processing the substrate are provided in a processing container so as to face each other, and the processing gas introduced from introduction ports formed in an end portion of the gas supply part on the opposite side of the gas supply part from the mounting table is supplied to the substrate from gas supply holes formed in an end portion of the gas supply part on the side of the mounting table,

• wherein the gas supply part includes a central region facing a central portion of the substrate and one or more outer peripheral regions surrounding the central region and having an annular shape around a center axis of the gas supply part in a plan view,
• the gas supply holes and the introduction ports are provided for each of the central region and the outer peripheral regions,
• the introduction ports corresponding to the outer peripheral regions are formed in an annular shape around the center axis in a plan view, and
• the processing gas whose gas supply conditions are adjusted for each of the regions is continuously and outwardly supplied in a circumferential direction around the center axis from the introduction ports corresponding to the outer peripheral regions to the gas supply holes corresponding to the outer peripheral regions.