Lateral plasma/radical source
AssigneeApplied Materials, Inc.
InventorsAnantha K. Subramani, Kaushal Gangakhedkar, Abhishek Chowdhury, John C. Forster, Nattaworn Nuntaworanuch, Kallol Bera, Philip A. Kraus, Farzad Houshmand
Life of this patent
Estimating the term…