Support apparatus, lithographic apparatus and device manufacturing method

A device manufacturing method using a lithographic apparatus, the method comprising:

• supporting a substrate on a support apparatus, the support apparatus comprising an object holder supporting the substrate, and an extraction body outward of the object holder and partially extending under a peripheral edge of the substrate, the extraction body comprising a first opening and a second opening and the extraction body is essentially mechanically and thermally decoupled from the object holder;
• extracting fluid using the first and second openings through a gap, at an upper surface of the support apparatus, between the extraction body and the substrate;
• and
• projecting a beam onto the substrate.

A lithographic apparatus, comprising:

• a pattern transfer system configured to transfer a pattern onto a substrate;
• a fluid handling system configured to provide a fluid to a space between the projection system and the substrate;
• an object holder configured to support an object;
• and
• an extraction body outward of the object holder and arranged to partially extend under a peripheral edge of the object when supported by the object holder, the extraction body comprising a first opening and a second opening, each of the first and second openings configured to extract fluid through a gap, at an upper surface, between the extraction body and the object when supported on the object holder, wherein the extraction body is essentially mechanically and thermally decoupled from the object holder.