US 10,120,288 B2Granted

Stage device, exposure apparatus, and method of manufacturing devices

AssigneeNikon Corporation

InventorYuichi Shibazaki

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Abstract

An exposure apparatus performs scanning exposure of a substrate with an illumination light via a projection optical. A mask is supported on a first base member, with a slider provided inside a movable member. The first base member is arranged above the projection optical system and has a first opening through which the illumination light passes. The mask is supported in a second opening of the slider, through which the illumination light passes. The slider moves inside the movable member by a first drive system. A stage having a holder that holds the substrate is moved on a second base member by a second drive system. The first and the second drive systems move the mask and the substrate relative to the illumination light during scanning exposure. The movable member is moved by a reaction force generated by a movement of the slider by the first drive system.

Claims18

Dependent claims

An exposure apparatus that has an illumination optical system configured to illuminate a mask with an illumination light and a projection optical system configured to project a pattern image of the mask onto a substrate, and performs scanning exposure of the substrate by moving each of the mask and the substrate relative to the illumination light, the apparatus comprising:

a first base member arranged above the projection optical system and having a first opening through which the illumination light passes;
a first stage system that has a slider, a movable member and a first drive system, the slider being arranged on the first base member, the slider having a second opening through which the illumination light passes and a support member that is located in the second opening and supports the mask inside of the second opening, the movable member being arranged on the first base member and being provided with the slider inside, the first drive system having a first motor and moving the slider inside the movable member, and the first motor having a mover provided at the slider and a stator provided at the movable member;
a second base member arranged below the projection optical system;
a second stage system that has a stage and a second drive system, the stage being arranged on the second base member and having a holder that holds the substrate, the second drive system having a second motor that drives the stage, and the second drive system moving the stage on the second base member;
and
a controller that controls the first and the second drive systems so that the mask and the substrate are each moved relative to the illumination light in a first direction orthogonal to an optical axis of the projection optical system, during the scanning exposure, wherein
the movable member is configured to be moved by a reaction force generated by a movement of the slider by the first drive system, and
the first motor includes a pair of magnetic pole units disposed above and below a support surface with which the support member supports the mask.

5 more elements

An exposure method of performing scanning exposure of a substrate with an illumination light via a projection optical system, the method comprising:

supporting a mask on a first base member, with a slider provided inside a movable member, the first base member being arranged above the projection optical system and having a first opening through which the illumination light passes, and the mask being supported by a support member inside of a second opening, through which the illumination light passes, of the slider;
moving the slider inside the movable member, with a first drive system that has a first motor having a mover provided at the slider and a stator provided at the movable member, the first motor including a pair of magnetic pole units disposed above and below a support surface with which the support member supports the mask;
moving a stage having a holder that holds the substrate on a second base member, with a second drive system having a second motor that drives the stage, the second base member being arranged below the projection optical system;
and
controlling the first and the second drive systems so that the mask and the substrate are each moved relative to the illumination light in a first direction orthogonal to an optical axis of the projection optical system, during the scanning exposure, wherein
the movable member is moved by a reaction force generated by a movement of the slider by the first drive system.

3 more elements

Dependencies are inferred from the claim text.

Facts

Application: 14/844,990Filed 3 Sep 2015 · division
Priority: JP 2003-03792917 Feb 2003
Published: US 2016/0048084 A118 Feb 2016
Granted: 6 Nov 2018
Term ends: Not estimatedThe source records don’t support an estimate.

Classification7 codes

G03F 7/70058
Microphotolithographic exposure; Apparatus therefor: mask illumination systems
G03F 7/70716
Handling of masks or workpieces: stages
G03F 7/70758
Handling of masks or workpieces: drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
G03F 7/70766
Handling of masks or workpieces: reaction force control means, e.g. countermass

Family

PCT/JP2004/000655Parent of this continuation-in-part · filed 26 Jan 2004
Application11/147,287Parent of this division · filed 8 Jun 2005
Application12/318,575Parent of this division · filed 31 Dec 2008
US 2016/0048084 A1Pre-grant publication · published 18 Feb 2016
US 9,152,060 B2Parent of this division
US 7,489,389 B2Parent of this division
Application11/147,287Parent of this continuation-in-part
US 2005/0248744 A1Published application
US 2009/0122293 A1Published application
US 10,120,288 B2This patent

From the US filing history. Foreign family members aren’t listed.

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