Developing method, developing apparatus and storage medium

A developing apparatus comprising:

• a substrate holder configured to horizontally hold a substrate;
• a rotating mechanism configured to rotate the substrate holder about a vertical axis;
• a developer nozzle configured to supply a developer onto a part of the substrate to form a liquid puddle;
• a moving mechanism configured to move the developer nozzle in a radial direction of the rotating substrate;
• a contact part configured to be moved together with the developer nozzle, the contact part having an opposite surface opposed to the substrate, which is smaller than the surface of the substrate;
• a turning-flow generating mechanism configured to generate a turning flow in the liquid puddle on an area below the opposite surface of the contact part, by applying, from above the substrate, an operation for rotating the liquid puddle about an axis perpendicular to the substrate;
• and
• a control unit configured to output a control signal such that a supply position of the developer on the substrate is moved in the radial direction of the substrate, in order that the liquid puddle is spread out on a whole surface of the substrate, while the contact part is being in contact with the liquid puddle on the rotating substrate,
• wherein the control unit is configured to output a control signal such that a turning flow is generated in the liquid puddle, while rotating the substrate holder and supplying the developer from the developer nozzle to the liquid puddle.