Chemically amplified resist material and resist pattern-forming method

A chemically amplified resist material comprising:

• a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid;
• and
• a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure,
• wherein the polymer component comprises:
• a first polymer comprising a first structural unit that comprises a fluorine atom and does not comprise a salt structure;
• or
• a second polymer comprising a second structural unit that comprises a fluorine atom and a salt structure, and
• wherein the generative component comprises:
• a radiation-sensitive sensitizer generating agent;
• and a radiation-sensitive acid generating agent,
• wherein
• the radiation-sensitive sensitizer generating agent is capable of generating, upon the exposure to a first radioactive ray that is a radioactive ray having a wavelength of no greater than 250 nm, the radiation-sensitive sensitizer absorbing a second radioactive ray that is a radioactive ray having a wavelength of greater than 250 nm, does not generate an acid upon the exposure to the first radioactive ray, and substantially does not generate the radiation-sensitive sensitizer upon the exposure to the second radioactive ray without the exposure to the first radioactive ray, and
• the radiation-sensitive acid generating agent is capable of generating an acid upon the exposure to the first radioactive ray, does not generate a radiation-sensitive sensitizer upon the exposure to the first radioactive ray, and substantially does not generate the acid upon the exposure to the second radioactive ray without the exposure to the first radioactive ray.